| 000 | 00933nam a2200433Ia 4500 | ||
|---|---|---|---|
| 008 | 130912s9999 xx 000 0 und d | ||
| 040 | _cIIIM | ||
| 080 | _a0 | ||
| 245 | 2 | _aA method of manufacturing an etchant for | |
| 260 | _a0 | ||
| 260 | _bGovt. of India, The Pate | ||
| 260 | _c0 | ||
| 650 | _aChemical Tests | ||
| 653 | _a142247 | ||
| 653 | _aASCERTAINS | ||
| 653 | _aCAPACITORS | ||
| 653 | _aDEPOSITED | ||
| 653 | _aDESCRIBES | ||
| 653 | _aETCHANT | ||
| 653 | _aETCHING | ||
| 653 | _aFABRICATING | ||
| 653 | _aFILM | ||
| 653 | _aFOLLOWING | ||
| 653 | _aGLASS | ||
| 653 | _aINVENTION | ||
| 653 | _aMANNER | ||
| 653 | _aMANUFACTURING | ||
| 653 | _aMETHOD | ||
| 653 | _aMONOXIDE | ||
| 653 | _aNATURE | ||
| 653 | _aPARTICULARLY | ||
| 653 | _aPERFORMED | ||
| 653 | _aPLATE | ||
| 653 | _aSELECTIVE | ||
| 653 | _aSILICON | ||
| 653 | _aSPECIFICATION | ||
| 653 | _aTHIN | ||
| 942 | _cBK | ||
| 999 |
_c12911 _d12911 |
||
| 856 |
_uhttp://library.iiim.res.in:80/cgi-bin/koha/opac-detail.pl?biblionumber=12911 _yhttp://library.iiim.res.in:80/cgi-bin/koha/opac-detail.pl?biblionumber=12911 |
||